Please use this identifier to cite or link to this item: http://hdl.handle.net/123456789/10123
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dc.contributor.authorDruzhinin, A.-
dc.contributor.authorOstrovskii, I.-
dc.contributor.authorKhoverko, Yu.-
dc.contributor.authorKoretskyy, R.-
dc.contributor.authorNichkalo, S.-
dc.date.accessioned2021-06-09T08:42:13Z-
dc.date.available2021-06-09T08:42:13Z-
dc.date.issued2014-
dc.identifier.citationDruzhinin A. A. Impedance of Sі Wires at Metal-Insulator Transition / A. A. Druzhinin, I. P. Ostrovskii, Yu. N. Khoverko1, R. N. Koretskyy, S. I. Nichkalo // Фізика і хімія твердого тіла. - 2014. - Т. 15. - № 1. - С. 81-84.uk_UA
dc.identifier.urihttp://hdl.handle.net/123456789/10123-
dc.description.abstractImpedance spectroscopy for Si wires with dopant concentrations near the metal-insulator transition in the low temperature range 4.2 - 70 K and frequencies 0.01 - 250 kHz has been conducted. The studies allow us to obtain parameters of hopping conduction (localization radius, density of localized states and average length of carrier jumping) and compare them with theoretical data.uk_UA
dc.language.isoenuk_UA
dc.publisherVasyl Stefanyk Precarpathian National Universityuk_UA
dc.subjectmagnetoresistanceuk_UA
dc.subjectimpedance spectroscopyuk_UA
dc.subjectlocalization radiusuk_UA
dc.titleImpedance of Sі Wires at Metal-Insulator Transitionuk_UA
dc.typeArticleuk_UA
Appears in Collections:Т. 15, № 1

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