Interaction of Electromagnetic H-wave with the thin Metal Film is Located on the Dielectric Substrate

Please use this identifier to cite or link to this item: http://hdl.handle.net/123456789/6970

Title:	Interaction of Electromagnetic H-wave with the thin Metal Film is Located on the Dielectric Substrate
Other Titles:	Взаємодія елетромагнітних H-хвиль з тонкими металічними плівками, розташованими на діелектричній підкладці
Authors:	Utkin, А. І Yushkanov, А. А.
Keywords:	the thin metal film dielectric environments reflection coefficient transmission coefficient
Issue Date:	2015
Publisher:	ДНВЗ "Прикарпатський національний університет імені Василя Стефаника"
Citation:	Utkin A. I. Interaction of Electromagnetic H-wave with the thin Metal Film is Located on the Dielectric Substrate / А. І. Utkin, А. А. Yushkanov // Фізика і хімія твердого тіла. - 2015. - Vol. 16. - № 2. - P. 253-256.
Abstract:	Interaction of electromagnetic H-wave with thin metal film is located between two dielectric environments ε1, ε2 in the case of different incident angles of H-wave θ and in the case of different reflection coefficients q1 и q2 is calculated in this article. Behavior analysis of reflection coefficient R, transmission coefficient T and absorption coefficient A in the case of its frequency dependence y and variation dielectric permeability of its environments is done.
URI:	http://hdl.handle.net/123456789/6970
Appears in Collections:	Т. 16, № 2

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