Please use this identifier to cite or link to this item: http://hdl.handle.net/123456789/6970
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dc.contributor.authorUtkin, А. І-
dc.contributor.authorYushkanov, А. А.-
dc.date.accessioned2020-05-08T06:23:08Z-
dc.date.available2020-05-08T06:23:08Z-
dc.date.issued2015-
dc.identifier.citationUtkin A. I. Interaction of Electromagnetic H-wave with the thin Metal Film is Located on the Dielectric Substrate / А. І. Utkin, А. А. Yushkanov // Фізика і хімія твердого тіла. - 2015. - Vol. 16. - № 2. - P. 253-256.uk_UA
dc.identifier.other10.15330/pcss.16.2.253-256-
dc.identifier.urihttp://hdl.handle.net/123456789/6970-
dc.description.abstractInteraction of electromagnetic H-wave with thin metal film is located between two dielectric environments ε1, ε2 in the case of different incident angles of H-wave θ and in the case of different reflection coefficients q1 и q2 is calculated in this article. Behavior analysis of reflection coefficient R, transmission coefficient T and absorption coefficient A in the case of its frequency dependence y and variation dielectric permeability of its environments is done.uk_UA
dc.language.isoenuk_UA
dc.publisherДНВЗ "Прикарпатський національний університет імені Василя Стефаника"uk_UA
dc.subjectthe thin metal filmuk_UA
dc.subjectdielectric environmentsuk_UA
dc.subjectreflection coefficientuk_UA
dc.subjecttransmission coefficientuk_UA
dc.titleInteraction of Electromagnetic H-wave with the thin Metal Film is Located on the Dielectric Substrateuk_UA
dc.title.alternativeВзаємодія елетромагнітних H-хвиль з тонкими металічними плівками, розташованими на діелектричній підкладціuk_UA
dc.typeArticleuk_UA
Appears in Collections:Т. 16, № 2

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